Micro/Macro Photoluminescence Mapping system Feature High performance & low cost PL Mapping system Wide extension wavelength range(UV-VIS-NIR, 350nm to 2.2um) Compact design & easy alignment Low noise & High PL signal detection Any excitation laser source available Easy to find a peak & FWHM Application General photoluminescence III-V materials Photoluminescence Fluorescence LD, LED Epi-wafer PL mapping Specifications 1.Micro/Macro Photoluminescence sample Chamber - Color corrected 10x M-Plan lens, wavelength range : 350-1800nm - Working Distance : 30.5mm, 20mm FL, Z axis adjustable - System spatial resolution : approx. 10um (min. 1um spatial resolution availble option) - Holed mirror for Laser beam & PL signal path - Iris Diaphragm set for laser beam alignment - Variable ND filter for laser power control, 99% to 2% - included laser line bandpass filter and laser cut-off filter set - 10mm aperture PL signal collimating lens - Motorized XY stage, Max. speed, 30mm/sec, 1um resolution for mapping - 2 & 4 Epi-Wafer sample holder plate. - Includes high resolution controller and cables 2. IG512, NIR spectrometer, 900-1700nm, 512pixels, InGaAs arrays, - 25um x 500um pixel size, 14bits, 2.5MHz digitizer, f/4, 40mm FL - Detection range : 900nm full width, 300gr/mm, 1um blaze grating - includes SMA905, 400um multimode fiber, 1meter length 3. EPP2000-VIS(350-1150nm) for UV-VIS, Diffraction grating spectrometer - f/4, symX-Czerny-turner type - Resolution: 1.6nm with 50um slit @600gr/mm grating), - Includes 2048pixel CCD detector, 12bit digitizer - 600gr/mm grating - Interface: USB-2 & parallel - SMA905 Fiber optic input, 0.22NA, 400um, 1meter length, multimode fiber